Please use this identifier to cite or link to this item: http://hdl.handle.net/10419/45100
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dc.contributor.authorLi, Xuanen_US
dc.date.accessioned2010-02-15en_US
dc.date.accessioned2011-04-26T07:40:50Z-
dc.date.available2011-04-26T07:40:50Z-
dc.date.issued2008en_US
dc.identifier.isbn978-92-9230-082-1en_US
dc.identifier.urihttp://hdl.handle.net/10419/45100-
dc.description.abstractA comparative study is undertaken that explores Chinese and Indian pharmaceutical industries under different patent regimes. It is found that relative to India, which had implemented process patent until 2005, China with a product patent regime since 1993 suffers from both lower drug accessibility and availability (the latter is a missing parameter in the literature). Also, China lags behind in both lower R&D investment and patents filed by Chinese nationals. Based on these findings and associated legal interpretation, we conclude that higher patent protection in China generates negative impacts on the pharmaceutical industries. Thus, governments should utilize TRIPS flexibilities and other regimes like price control to offset the anticompetitive effect in designing patent policies.en_US
dc.language.isoengen_US
dc.publisher|aUNU-WIDER |cHelsinkien_US
dc.relation.ispartofseries|aResearch paper / UNU-WIDER |x2008.36en_US
dc.subject.jelO34en_US
dc.subject.jelL65en_US
dc.subject.jelF14en_US
dc.subject.ddc330en_US
dc.subject.keywordproduct patenten_US
dc.subject.keywordprocess patenten_US
dc.subject.keywordTRIPSen_US
dc.subject.keywordpharmaceutical industriesen_US
dc.subject.keywordChinaen_US
dc.subject.keywordIndiaen_US
dc.subject.stwTRIPSen_US
dc.subject.stwPatentrechten_US
dc.subject.stwWohlfahrtseffekten_US
dc.subject.stwPharmazeutische Industrieen_US
dc.subject.stwChinaen_US
dc.subject.stwIndienen_US
dc.titleThe impact of higher standards in patent protection for pharmaceutical industries under the TRIPS Agreement: A comparative study of China and Indiaen_US
dc.typeWorking Paperen_US
dc.identifier.ppn571446388en_US
dc.rightshttp://www.econstor.eu/dspace/Nutzungsbedingungenen_US

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