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dc.contributor.authorHackett, Petal Jeanen_US
dc.date.accessioned2012-02-14en_US
dc.date.accessioned2012-02-15T17:38:07Z-
dc.date.available2012-02-15T17:38:07Z-
dc.date.issued2012en_US
dc.identifier.urihttp://hdl.handle.net/10419/55348-
dc.description.abstractContinued lobbying by high-end, American designers for intellectual property-type fashion design protection has culminated in the proposed Innovative Design Protection and Piracy Prevention Act, intended to introduce EU standards. Using a sequential, 2-firm, vertical differentiation framework, we analyze the effects of protection on investment in innovative designs by high-quality (designer) and lower-quality (mass-market) firms when the mass-marketer may opt to imitate, consumers prefer trendsetting designs and firms compete in prices. We show that design protection, by transforming mass-marketers from imitators to innovators, may reduce both designer profits and welfare. The model provides possible explanations for the dearth of EU case law and the increase in designer/mass-marketer collaborations.en_US
dc.language.isoengen_US
dc.publisherCESifo Münchenen_US
dc.relation.ispartofseriesCESifo working paper: Industrial Organisation 3716en_US
dc.subject.jelD21en_US
dc.subject.jelL13en_US
dc.subject.jelO31en_US
dc.subject.jelO34en_US
dc.subject.ddc330en_US
dc.subject.keywordintellectual property rightsen_US
dc.subject.keywordfashion design protectionen_US
dc.subject.keywordimitationen_US
dc.subject.keywordlicensingen_US
dc.subject.stwModeen_US
dc.subject.stwProduktdesignen_US
dc.subject.stwImmaterialgüterrechteen_US
dc.subject.stwWirkungsanalyseen_US
dc.subject.stwBekleidungsindustrieen_US
dc.subject.stwInnovationen_US
dc.subject.stwImitationswettbewerben_US
dc.subject.stwWohlfahrtseffekten_US
dc.subject.stwTheorieen_US
dc.subject.stwEU-Staatenen_US
dc.titleCutting too close? Design protection and innovation in fashion goodsen_US
dc.typeWorking Paperen_US
dc.identifier.ppn685243621en_US
dc.rightshttp://www.econstor.eu/dspace/Nutzungsbedingungenen_US
Appears in Collections:CESifo Working Papers, CESifo Group Munich

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